Please use this identifier to cite or link to this item: http://148.72.244.84:8080/xmlui/handle/xmlui/6950
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dc.contributor.authorAymen G. Hasan-
dc.contributor.authorZiad T. Khodair-
dc.contributor.authorAmmar A. Habeeb-
dc.date.accessioned2023-10-24T06:27:44Z-
dc.date.available2023-10-24T06:27:44Z-
dc.date.issued2023-07-01-
dc.identifier.citationhttps://doi.org/10.24237/ASJ.01.03.664Cen_US
dc.identifier.issn2958-4612-
dc.identifier.urihttp://148.72.244.84:8080/xmlui/handle/xmlui/6950-
dc.description.abstractIn this work, Cu NPs have been prepared by (PLA) method to ablate the Cu metallic target. The laser ablation process is done at energy by 540 and 700 mJ) at wavelengths of 1064 and 532 nm. Sn1-xCuxO2 thin film prepared by used chemical spray pyrolysis technique at x = 0.03, 0.05, 0.07 and 0.09. XRD measurements of the prepared thin films showed that thin films have a polycrystalline with a tetragonal structure, the crystallite size average of thin films increases randomly as Cu NPs ratio increased, and it was maximum (~ 30.7nm) for the Sn0.93Cu0.07O2 thin film prepared. AFM results showed that the Sn0.93Cu0.07O2 thin films have maximum grain size with roughness and RMS of the thin films. The optical properties studied in the range (300- 900) nm, the transmittance increased as the wavelength increasing abuot (300-450) nm, it was found that the lesser transmittance (79%) for Sn0.95Cu0.05O2, the energy band gap firstly is decreasing after that is increasing as copper NPs ratio increasing, as its value about (4.05-3.85) eV.en_US
dc.description.sponsorshiphttps://acadscij.uodiyala.edu.iq/en_US
dc.language.isoenen_US
dc.publisherUniversity of Diyalaen_US
dc.subjectPLA, Chemical spray pyrolysis, XRD diffraction, Optical Propertiesen_US
dc.titleFabrication and Characterization of Sn1-XCuxO2 Thin Films Prepared by Chemical Spray Pyrolysis Techniqueen_US
dc.typeArticleen_US
Appears in Collections:مجلة ديالى للعلوم الاكاديمية / Academic Science Journal (Acad. Sci. J.)

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