Please use this identifier to cite or link to this item:
http://148.72.244.84:8080/xmlui/handle/xmlui/3928Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ammar T. Salih | - |
| dc.contributor.author | Kadhim R. Gbashi | - |
| dc.contributor.author | Tawfeeq Kadhem Salman | - |
| dc.date.accessioned | 2023-10-17T07:04:22Z | - |
| dc.date.available | 2023-10-17T07:04:22Z | - |
| dc.date.issued | 2018 | - |
| dc.identifier.citation | http://dx.doi.org/10.24237/djps.1401.331C | en_US |
| dc.identifier.issn | 2222-8373 | - |
| dc.identifier.uri | http://148.72.244.84:8080/xmlui/handle/xmlui/3928 | - |
| dc.description.abstract | Uniform layers of SiO2 were prepared using thermal evaporation technique under high vacuum (10-5 mbar). Many characterizations were investigated using these films as antireflective layers. The morphological, crystal structural and optical properties of the layers were investigated by using SEM, XRD, and UV-Vis instruments. | en_US |
| dc.description.sponsorship | https://djps.uodiyala.edu.iq/ | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | university of Diyala | en_US |
| dc.subject | thin films, thermal evaporation, SiO2, antireflection | en_US |
| dc.title | Preparation and Characterization of SiO2 Thin Films as an Antireflective Layer | en_US |
| dc.type | Article | en_US |
| Appears in Collections: | مجلة ديالى للعلوم الاكاديمية / Academic Science Journal (Acad. Sci. J.) | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 6e-p1(331).pdf | 685.9 kB | Adobe PDF | View/Open |
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