Please use this identifier to cite or link to this item:
http://148.72.244.84:8080/xmlui/handle/xmlui/3928| Title: | Preparation and Characterization of SiO2 Thin Films as an Antireflective Layer |
| Authors: | Ammar T. Salih Kadhim R. Gbashi Tawfeeq Kadhem Salman |
| Keywords: | thin films, thermal evaporation, SiO2, antireflection |
| Issue Date: | 2018 |
| Publisher: | university of Diyala |
| Citation: | http://dx.doi.org/10.24237/djps.1401.331C |
| Abstract: | Uniform layers of SiO2 were prepared using thermal evaporation technique under high vacuum (10-5 mbar). Many characterizations were investigated using these films as antireflective layers. The morphological, crystal structural and optical properties of the layers were investigated by using SEM, XRD, and UV-Vis instruments. |
| URI: | http://148.72.244.84:8080/xmlui/handle/xmlui/3928 |
| ISSN: | 2222-8373 |
| Appears in Collections: | مجلة ديالى للعلوم الاكاديمية / Academic Science Journal (Acad. Sci. J.) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 6e-p1(331).pdf | 685.9 kB | Adobe PDF | View/Open |
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