Please use this identifier to cite or link to this item: http://148.72.244.84:8080/xmlui/handle/xmlui/5974
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dc.contributor.authorM. Tawfeek-
dc.contributor.authorMustafa K. Jassim-
dc.contributor.authorFiras M. Hady-
dc.contributor.authorRafah I. Nori-
dc.date.accessioned2023-10-22T10:34:41Z-
dc.date.available2023-10-22T10:34:41Z-
dc.date.issued2015-
dc.identifier.issn2222-8373-
dc.identifier.urihttp://148.72.244.84:8080/xmlui/handle/xmlui/5974-
dc.description.abstractSputtering yield behaviour of target bombarded by Argon ions plasma is studied through the reduction of TRIM ( Transport of Ions in Matter ) simulation data . The angular dependence of normalized sputtering yield of GaAs is studied. Further the effect of increasing ion energy, the effect of increasing ion numbers , the influence of GaAs width, and the effect of changing the surface binding energy of elements composed GaAs target upon the sputter yield are studied. It was found that the entire parameters mentioned have very strong effects on the sputtering yield of GaAs.en_US
dc.description.sponsorshiphttps://djps.uodiyala.edu.iq/en_US
dc.language.isoenen_US
dc.publisherUniversity of Diyalaen_US
dc.subjectsputtering yield, TRIM ( Transport of Ions in Matter ) program, Argon ions, GaAsen_US
dc.titleA Computer Simulation Study of Sputtering Yield of Target Bombarded by Argon Ionsen_US
dc.typeArticleen_US
Appears in Collections:مجلة ديالى للعلوم الاكاديمية / Academic Science Journal (Acad. Sci. J.)

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